PropertyValue
?:definition
  • Equipment designed to form an even coating of metal by means of a sputtering procedure on the surface of a sample to be observed using an electron microscope. Sputtering is the process of bombarding a material with heavy atoms or ions with sufficient energy to dislodge and transfer the material to a different location. A high voltage creates a charge at the target surface and at the same time strips an electron from the sputtering gas (usually argon). Since the target has the opposite charge to the argon ion, the ions are attracted to the target forming a thin and even (usually in the order of nanometers) coating on samples placed close to the anode. The process is usually performed in a partial vacuum container with a suitable gas environment. Metallic sputtering of the samples avoid charging the sample, reduce thermal damage, and improve secondary electron emission during scanning electron microscopy and other thin film applications.
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Anon_0  
<http://www.w3.org/1999/02/22-rdf-syntax-ns#type> <http://purl.org/net/provenance/ns#DataItem>
<http://www.w3.org/1999/02/22-rdf-syntax-ns#type> <http://www.w3.org/2004/03/trix/rdfg-1/Graph>
<http://xmlns.com/foaf/0.1/primaryTopic> <https://research.tib.eu/covid-19/entity/C5423006_UMD>
<http://xmlns.com/foaf/0.1/topic> Anon_0
<http://www.ontologydesignpatterns.org/cp/owl/informationrealization.owl#realizes> <https://research.tib.eu/covid-19/data/entity/C5423006_UMD>
<http://purl.org/net/provenance/ns#createdBy>
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